Qnity Electronics, Inc. (“Qnity”) (NYSE: Q), a premier technology solutions leader across the semiconductor value chain, today announced that it has won the 2025 R&D 100 Award in the Mechanical/Materials category for its breakthrough technology, UV™ 26GNF photoresist, supporting the advancement of sustainability in semiconductor manufacturing.
The R&D 100 Awards, sponsored by R&D World Magazine, honor the 100 most innovative technologies of the previous year and are widely regarded as the “Oscars of Innovation.” This year’s ceremony took place on Thursday, Nov. 20, in Scottsdale, Ariz.
“We are honored to see Qnity innovation recognized amongst the year’s most impactful technology achievements,” said Randal King, Chief Technology and Sustainability Officer. “At the heart of our innovation is the idea that technology can and should serve both progress and sustainability, and UV™ 26GNF resist is a flagship example of this approach.”
Qnity’s award-winning UV™ photoresist delivers precise control in lithographic patterning, a critical process in integrated circuit production. The novel composition substitutes industry-standard per- and polyfluoroalkyl substance (PFAS)-containing compounds with non-fluorine alternatives, supporting sustainability goals for eliminating substances of concern, safety, and reliability—while continuing to maintain the demanding standards of semiconductor manufacturing.
To get the product to customers quickly for testing, Qnity’s research and development team leveraged advanced computational modeling and digital tools to accelerate the product development process. Earlier this year, the company’s team was recognized with SPIE’s Jeffrey Byers Best Poster Award in Patterning Materials and Processes for this research effort.
“Qnity is powering our customers and industry to transform efficiency and performance in semiconductor fabrication, and we’re pioneering new standards for safety and sustainability,” said Sang Ho Kang, President, Semiconductor Technologies at Qnity. “With the commercial success of UV™ 26GNF photoresist, we’re proud to be on the leading edge of this movement, which has the potential to catalyze an industry-wide shift.”
In addition to UV™ 26GNF resist for KrF lithography which is commercially available, Qnity is expanding its non-fluorine lithography materials family across other wavelengths and nodes, reinforcing its leadership in semiconductor innovation.
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