Nova (Nasdaq: NVMI) today announced that its ELIPSON® materials metrology solution has been selected as Tool of Record by a leading global foundry customer for advanced Gate-All-Around (GAA) manufacturing processes.
The Company has received orders and delivered several ELIPSON® tools to the customer for use in various high-volume production processes.
The selection marks a significant milestone for the Nova ELIPSON® platform, which is designed to deliver non-destructive, in-die material characterization for the most challenging nodes in semiconductor fabrication. This selection joins the recent adoption of the Nova Metrion® platform by another GAA customer, further expanding the presence of Nova’s materials metrology solutions in advanced logic nodes production.
Nova ELIPSON® leverages state-of-the-art Raman spectroscopy technology to provide precise, repeatable measurements of material properties—key requirements for next-generation device architectures. By enabling rapid, non-contact material analysis at the nanoscale, ELIPSON® supports manufacturers’ needs for both innovation and efficiency in a dynamic market landscape.
Gaby Waisman, President and CEO of Nova, commented: “The selection of Nova ELIPSON® by a leading global foundry for Gate-all-Around manufacturing, underscores our commitment to delivering differentiated solutions for the evolving needs of our customers. These latest developments indicate the significant value of our materials metrology portfolio to the industry’s need for critical process insight in advanced nodes production.”
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